Reliable

Robust construction, reliable under varying operating conditions, leak-tight, barrier gas connection

High performance

Optional version to prevent powder and particle deposits, excellent volumetric efficiency, high ultimate pressure, increases the performance of a vacuum system by up to a factor of ten, integrated bypass valve, specially designed for medium and high vacuum applications including semiconductor processes, light-weight internal components for fast production cycles

Flexible

Can be flanged directly on the system at any position, boosts the performance of all types of backing pumps, with vertical or lateral discharge

Technical specifications

ISO 50 Hz

Dimensional drawing

PANDA WZ 3600 A

Pumping speed

Air at 20 °C. Tolerance: ± 10%

Downloads