Description
PRODUCT LEAFLET
THE NEW GENERATION OF DRY VACUUM PUMPS FOR DEMANDING PROCESSES
High performance
Advanced screw design, excellent running qualities, integrated vacuum booster, perfectly suited for chemical vapor deposition, rapid thermal processing or atomic layer deposition
Efficient
Low cost of ownership, minimal maintenance, long service intervals, high uptime, efficient indirect water cooling, high hydrogen throughput
Compact
Fit-in-place design, directly mounted canned motor, backing pump and vacuum booster combined on a compact base frame
Technical specifications
ISO 50 Hz
Dimensional drawing
COBRA DS 0700–2000 G
Pumping speed
Air at 20 °C. Tolerance: ± 10%
Markets & applications
Flat panel display production
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Plasma-enhanced chemical vapor deposition (PECVD)
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Load lock chambers
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Organic light-emitting diode (OLED)
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Physical vapor deposition (PVD)
Lithium ion battery production
Degassing
Semiconductor production
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Medium
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Harsh
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Light
Solar power industry
Plasma-enhanced chemical vapor deposition (PECVD)
