Nominal pumping speed:
min. 1830.0 m³/h max. 3200.0 m³/h

Description

PRODUCT LEAFLET


THE NEW GENERATION OF DRY VACUUM PUMPS FOR DEMANDING PROCESSES

High performance

Advanced screw design, excellent running qualities, integrated vacuum booster, perfectly suited for chemical vapor deposition, rapid thermal processing or atomic layer deposition

Efficient

Low cost of ownership, minimal maintenance, long service intervals, high uptime, efficient indirect water cooling, high hydrogen throughput

Compact

Fit-in-place design, directly mounted canned motor, backing pump and vacuum booster combined on a compact base frame


Technical specifications

ISO 50 Hz

COBRA DS 2610–3161 B/E/F


Dimensional drawing

COBRA DS 2610–3161 B/E/F

COBRA DS 2610–3161 B/E/F


Pumping speed

Air at 20 °C. Tolerance: ± 10%

COBRA DS 2610–3161 B/E/F


Markets & applications

Flat panel display production

  1. Plasma-enhanced chemical vapor deposition (PECVD)
  2. Load lock chambers
  3. Organic light-emitting diode (OLED)
  4. Physical vapor deposition (PVD)
Lithium ion battery production

         Degassing
Semiconductor production

  1. Medium
  2. Harsh
  3. Light
Solar power industry

  1. Load lock chambers
  2. Plasma-enhanced chemical vapor deposition (PECVD)

Accessories

  1. Optional powder process version available (only for DS 3010 F and DS 3161 B)
  2. Optional tantal coating

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